Modified vapour chemical deposition (MCVD)

Modified Vapour Chemical Deposition (MCVD)

Modified vapour chemical deposition block diagram

The Modified Chemical Vapor Deposition is Shown in the figure. The glass vapour particles arising from the reaction constituent metal halides gases and oxygen flow through the inside of the revolving silica tube. As the SiO2 particles are deposited, they are sintered to a clear glass layer by Oxy hydrogen torch which travels back and forth along the tube.

       When the desired thickness of glass has been deposited, the vapour flow is shut off and the tube is heated strongly causing it to collapse into a solid rod preform. The fiber that is subsequently drawn from this preform rod will have a core that consists of the vapour-deposited material and a cladding consisting of the original silica tube.

Vapour phase axial deposition (VAD)

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